以電混凝浮除程序處理半導體廠氫氟酸廢水之研究.docVIP

以電混凝浮除程序處理半導體廠氫氟酸廢水之研究 Treatment of wastewater containing HF from a semiconductor manufactory using electro-coagulation-flotation processes (ECF) 研究生：黃繼緯 Huang Chi-Wei 指導教授：林耀堅 Lin, Yaw Jian 【摘要】 目前台灣半導體製造業主要以傳統的化學沉降法作為氟系廢水的處理，其混凝劑為石灰、氯化鈣等含鈣鹽類，但由於化學沉降後所產生的晶體非常細小，故須以高分子聚合物或鋁鹽混凝後，才能有效去除。此外，由於氟化鈣仍有一定的溶解性，故通常都須加入過量的鈣鹽才能得到較佳的去除率。過量加藥不但增加藥品成本，殘餘的過量鈣離子會大量增加水的硬度，影響回收利用的可行性。 本研究利用鋁片為電極的電混凝浮除系統(Electro-Coagulation-Flotation)來處理人工合成的含氟廢水，先以適當的鈣鹽降低氟離子的濃度，在沒有共存陰離子干擾下，當電流為0.75A時可以作為一個最佳的操作條件，在反應10分鐘後，殘留的氟離子濃度即可降低至廢水排放標準（15 mg/L）以下，而在濁度的部份也有非常明顯的效果。而在共存陰離子干擾下，硫酸根離子、磷酸根離子和硝酸根離子確實會影響最終的氟離子濃度，在濁度的部份也有非常明顯的增加。 處理半導體廠的的氫氟酸廢水，先以不同濃度的鈣鹽降低氟離子的濃度，並且添加不同濃度的油酸鈉，以0.75 A為固定的電流，當氧化鈣為750 mg/L且油酸鈉濃度為3 mg/L時，經過電混凝浮除20分鐘後，殘留的氟離子濃度即可降低至廢水排放標準（15 mg/L）以下，殘餘氟離子濃度為11.98 mg/L，而濁度也可以降至6.8 NTU，最終放流水的pH為8.8。 關鍵字：電混凝浮除、氫氟酸、濁度、油酸鈉 【Abstract】 The treatment of semiconductor wastewater containing fluoride in Taiwan was using traditional chemical coagulation such as CaCl2 and CaO. The crystal particles after chemical precipitation are very fine. In order to achieve better removal efficiency, polymers or aluminum salts are needed. Furthermore, CaF2 is easily to be dissolved, so more calcium salt is necessary to achieve better removal efficiency. The excess of calcium salt increases the cost. Calcium ion raises the water hardness and affects the recycle feasibility. In this study, the electro-coagulation-flotation processes were used to treat the fluoride-containing wastewater. Without co-existing anions, the electric current of 0.75A demonstrated an optimum effect on the removal of turbidity. After 10 min of reaction, the fluoride concentration was lower than 15 mg/L. With co-existing anions, such as SO42-, HPO42- and NO3- fluoride concentration and turbidity were affected. To treat the wastewater containing HF from a semiconductor manufactory, the electric current of 0.75A, calcium salt concentration of 750 mg/L and the sodium oleate concentration of 3 mg/L showed an optimum effect on the