低反射率多晶硅绒面的湿法制备研究张力典.pdfVIP

36 3 电 子 器 件 Vol． 36 No． 3 第 卷 第 期 20 13 6 Chinese Journal of Electron Devices Jun． 20 13 年 月 * Study on Preparation of Low Reflectivity Multicrystalline Silicon by Wet Etching 1 1，2 * 1 1 1 ZHANG Lidian ，SHEN Honglie ，YUE Zhihao ，WANG Wei ，JIANG Ye (1． College of Materials Science and Technology ，Nanj ing University of Aeronautics and Astronautics ，Nanj ing 2100 16 ，China ; 2． Key Laboratory f or Intelligent Nano Materials and Devices of the Ministry of Education ，Nanj ing University of Aeronautics ＆ Astronautics ， Nanj ing 2100 16 ，China) Abstract :In the preparation process of multicrystalline silicon solar cells ，multicrystalline silicon surface texturing is a hot research topic at all times． The surface reflectivity and morphology of the textured silicon are affected by various factors． The multicrystalline silicon wafers were etched in the mixed solution of HF ，HNO and H O． Etching time ，the 3 2 volume ratios of HF and HNO and the volume of H O in the solution were studied． The surface reflectances of the 3 2 etched multicrystalline silicon wafers were analyzed by spectrophotometer and the morphologies of the textured silicon wafers were observed by scanning electron microscopy． It was found that the volume ratios of HF ，HNO and H O has a 3 2 major impact on the mor