乙炔流量对Si-DLC薄膜机械性质影响之研究-YOKEnet.PDF

乙炔流量對Si-DLC 薄膜機械性質影響之研究 1† 1‡ 1 楊玉森 羅安成 鍾佳良 1 國立高雄第一科技大學機械與自動化工程系 摘要 本研究利用非平衡磁控濺鍍在 SKH51 高速鋼表面上濺鍍 Si-DLC 薄膜，主要是要探討乙 炔流量對Si-DLC 薄膜機械性質之影響。實驗固定參數為中頻電源(矽及碳)靶電流 1.5 安培 、 直流電源(碳)靶電源 3 安培、基材偏壓60 伏特、基板治具轉速 9 rpm 、基板偏壓頻率 100 仟 赫之、離子轟擊電壓-300 伏特。改變乙炔流量，從0 ~10 sccm 為變數進行實驗。實驗結果由 Raman 分析得知，此薄膜中同時含有 SiC 與 Si-DLC 結構。在機械性質部分 ，當乙炔流量逐 漸上升時，磨耗率由原本的 1.43E-05 (mm3 ‧N-1 ‧m-1)降低為1.30E-07 (mm3 ‧N-1 ‧m-1) ，其 耐磨耗性可提高99 倍 ，而硬度從Hv4037 降低為Hv2905 。 關鍵字：非平衡磁控濺鍍、Si-DLC 薄膜、乙炔流量 abstract This study investigates the acetylene gas flow rate effect on mechanical properties of Si-DLC film, prepared by unbalanced magnetron sputtering process. The fixed process parameters are Si and C target current at 1.5 A by middle ratio frequency power generator, direct current on target at 3A, bias voltage of substrates at -60 V, rotation speed of substrate holder at 9 rpm, substrate pulse frequency at 100 kHz and ion beam voltage at -300 V in heating stage. The acetylene gas flow rate varied from 0 to 10 sccm. The experimental results of Raman specification analysis show that SiC and Si-DLC structures were both existence in silicon carbide films. Additionally, the results show that the wear rate of films decreases from 1.43E-5 to 1.30E-7 (mm3 ‧N-1 ‧m-1) with the increase of acetylene gas flow rate, i.e. 99 times than initial condition. Nevertheless, the hardness of films decreases from Hv10g 4037 to Hv10g 2905. It reveals that the films exhibit more wear resistance property. 、 、 Key word: unbalanced magnetron sputtering process Si-DLC thin film acetylene flow rate 一、前言 類鑚碳（Diamond-like Carbon, DLC ）薄膜的特徵有：高硬度、優越的耐磨耗性、表面平 滑、摩擦係數小、耐腐蝕性優、近紅外光區的透光率佳以及絕緣性良好等，一般應用在刀具 鍍膜、切削工具及生醫工件上，其優越的特性可