投影光刻机硅片调焦调平测量模型.pdfVIP

27 11 V ol . 27, No . 11 2007 11 A CT A OPT ICA SI NICA N ov ember , 2007 : ( 2007) 1119 875 投影光刻机硅片调焦调平测量模型* 李小平 陈飞彪 ( , 430074) : , , , , , , 10 nm , 100 nm : : T P212. 6 : A Measurement Model of Focusing and Leveling Measurement System for Projection Lithography Tool Li Xiaoping Che