集成电路关键可靠性挑战及分析.docVIP

集成电路关键可靠性挑战及分析 黄 勇，恩云飞 （1．信息产业部电子第五研究所，广东 广州 510610；2.广东工业大学材料学院，广东 广州 510090） 摘要：本文论述了集成电路的关键可靠性挑战：高k栅极电介质和Cu互连/低k介质，它们是COMS器件发展的方向和出路。 关键字：可靠性；高k；Cu互连；低k；失效机理 Critical Reliability Challenges and Analyses for Integrate Circuit HUANG Yong , EN Yun-fei (1.CEPREI, Guangzhou 510610; 2.Guangdong University of Technology, Guangzhou 510090) Abstract: This paper discusses the critical reliability challenges for Integrate Circuit: high-k gate dielectrics and copper/low-k interconnects, which are the approach and route for the development of CMOS. Key words: reliability; high-k; copper interconnec