X射线光电子能谱(XPS).pdfVIP

X射线光电子能谱(XPS) 2013-10 表面分析 The Study of the Outer-Most Layers of Materials (100 Å).  Electron Spectroscopies XPS: X-光电子能谱 AES: 俄歇电子能谱 EELS: 电子能量损失谱 福州大学测试中心XPS仪器简介 X-射线光光电子能谱(XPS)  XPS 的物理基础  结合能与化学位移  XPS 谱的一般特性  XPS在不同领域的应用  XPS光谱仪及新技术发展介绍 XPS Background  XPS technique is based on Einstein’s idea about the photoelectric effect, developed around 1905.  The concept of photons was used to describe the ejection of electrons from a surface when photons were impinged upon it  During the mid 1960’sDr. Siegbahn and his research group developed the XPS technique.  In 1981, Dr. Siegbahn was awarded the Nobel Prize in Physics for the development of the XPS technique. 1. H. Hertz, Ann. Physik 31,983 (1887). 2. A. Einstein, Ann. Physik 17,132 (1905). 1921 Nobel Prize in Physics. 3. K. Siegbahn, Et. Al.,Nova Acta Regiae Soc.Sci., Ser. IV, Vol. 20 (1967). 1981 Nobel Prize in Physics. 什么是光电子能谱?  XPS (X-ray Photoelectron Spectroscopy) 又被称为ESCA (Electron Spectroscopy for Chemical Analysis) 。  它是以X射线为探针检测由表面出射的光电子来获取表面信息的，这 些光电子主要来自表面原子的内壳层携带有表面丰富的物理和化学信息。  XPS作为表面分析技术的普及归因于其高信息量、其对广泛样品的适 应性以及其坚实的理论基础。 一、X-射线光电子能谱产生过程 Electrons are extracted only from a narrow solid X-ray Beam angle. X射线穿透深度 ~1mm，整个区域 的电子将被激发。 10 nm 1 mm2 2 X-ray