Properties of aluminum oxide thin film obtained by metal plasma immersion ion implantation and deposition after zirconium-based pretreatment》.pdf

Vacuum 121 (2015) 32e41 Contents lists available at ScienceDirect Vacuum journal homepage: /locate/vacuum Properties of aluminum oxide thin film obtained by metal plasma immersion ion implantation and deposition after zirconium-based pretreatment Demetrio Jackson dos Santos a, Lara Basilio Tavares a, Renato Altobelli Antunes a, *, Roosevelt Droppa Jr. b, Tiago Fiorini da Silva c, Maria Cecilia Salvadori c a ^ Centro de Engenharia, Modelagem e Ciencias Sociais Aplicadas, UFABC, Santo Andre, SP, 09210-580, Brazil b ^ Centro de Ciencias Naturais e Humanas, UFABC, Santo Andre, SP, 09210-580, Brazil c ~ ~ Instituto de Física, Universidade de Sao Paulo, Sao Paulo, SP, 05389-970, Brazil a r t i c l e i n f o a b s t r a c t Article history: Aluminum oxide thin films were obtained by metal plasma immersion ion implantation and deposition Received 19 April 2015 (MePIIID) and subsequently converted by a zirconium based surface pretreatment. Thin films atomic Received in revised form composition was studied using Rutherford backscattering spectrometry (RBS) and forward recoil spec- 23 July 2015 trometry (FRS), especially for hydrogen measurement. Film morphology and thickness were investigated Accepted 25 July 2015 by atomic force microscopy (AFM) and field emission scanning elec