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SEM を用いた半導体キャリア分布の観察技術.pdf
解析技術
SEMを用いた半導体キャリア分布の
観察技術
p-type n-type
*
鶴 見 大 輔 ・浜 田 耕太郎
Dopant Mapping in Semiconductors Using Scanning Electron Microscopy ─by Daisuke Tsurumi and Kotaro
Hamada ─This paper investigates the decrease in dopant contrast of semiconductors due to scanning electron
microscope (SEM) observation that causes contamination on the semiconductor surface. We have discovered that
second electron (SE) high-pas
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