半导体材料应用与研究-1.pptVIP

By: Wen-Jen Liu Date: 04/30/2001 page: * Photo: Raw material : Reticle, Photo Resist Equipment : I-Line(MUV), DUV, EUV (Stepper, SCANNER) Vendors: Nikon, ASML 2. Module definition - PHOTO The PHOTO concept was general Optics lithography to reproduce the specific patterns. Today we deployed the UV Excimer laser for the light, According to Optics principle, generally the wavelength of the light should be less than one tenth of half pitch, so if the technology shrink, the Exposure light source should be pushed into deeply UV zone. Thin-Film: Raw material : Metal Target, Chemical Equipm