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Model inter-comparison and evaluation of acid deposition
ARTICLE IN PRESS1352-2310/$ - se
doi:10.1016/j.at
Correspond
E-mail addrAtmospheric Environment 42 (2008) 3528–3542
/locate/atmosenvMICS-Asia II: Model inter-comparison and evaluation
of acid deposition
Zifa Wanga,, Fuying Xiea,m, T. Sakuraib, H. Uedab, Zhiwei Hanb,
G.R. Carmichaelc, D. Streetsd, M. Engardte, T. Hollowayf, H. Hayamig, M. Kajinok,
N. Thongboonchooc, C. Bennete, S.U. Parkh, C. Fungi, A. Changi,
K. Sarteletj, M. Amannl
aNZC/LAPC, Institute of Atmospheric Physics, Chinese Academy of Sciences, Beijing 100029, China
bAcid Deposition and Oxidant Research Center, Niigata, Japan
cCenter for Global and Regional Environmental Research, University of Iowa, Iowa, USA
dArgonne National Laboratory, Illinois, USA
eSwedish Meteorological and Hydrological Institute, Norrkoping, Sweden
fUniversity of Wisconsin-Madison, Wisconsin, USA
gCentral Research Institute of Electric Power Industry, Chiba, Japan
hSeoul National University, Seoul, Republic of Korea
iHong Kong Environmental Protection Department, Hong Kong SAR, China
jTeaching and Research Center in Atmospheric Environment, Marne la Valle?e, France
kDisaster Prevention Research Institute, Kyoto University, Kyoto, Japan
lInternational Institute for Applied System Analysis, Laxenburg, Austria
mGraduate University of Chinese Academy of Sciences, China
Received 17 March 2007; received in revised form 15 August 2007; accepted 30 December 2007Abstract
This paper focuses on the comparison of chemical deposition of eight regional chemical models used in Model Inter-
Comparison Study for Asia (MICS-Asia) II. Monthly-mean depositions of chemical species simulated by these models,
including dry deposition of SO2, HNO3, NH3, sulfate, nitrate and ammonium and wet deposition of SO4
2, NO3
and
NH4
+, have been provided for four periods (March, July, December 2001 and March 2002) in this work. Observations at
37 sites of the Acid Deposition Monitoring Network in East Asia (EANET) are compared with SO4
2, NO3
and NH4
+ wet
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