BCN薄膜XPS结构分析时荷电效应的校正.PDF

19 1 Vol.19 No.1 2006 2 CHINA SURFACE ENGINEERING Feb. 2006 16 2006 BCN XPS 150001 X XPSBCN 3 XPS FTIR 3 BCN BCN Ar BCN BCN XPS TG174.444 TB333 A 1007−9289(2006)01−0016−05 Correction of Charging Effect on Structure Analyse of BCN Films by XPS XU Shu-yan, MA Xin-xin, SUN Ming-ren (Department of Materials Science and Engineering, Harbin Institute of Technology, Harbin, 150001 China) AbstractThe structure of BCN amorphous nano-films were studied by XPS. The characteristic peak of three elements of Ar, contamination carbon and deposited monolayer Au were considered as reference peak to correct the shift of the XPS spectra caused by charging effect during the XPS analysis process, and the results of XPS and FTIR analyses were compared to estimate the correctness of this method. The investigation results indicated that the calculated binding energy of BCN film depends on reference peak selection, and the correct structures can be obtained when the bonding energy was adjus ted by selecting appropriate characteristic peak. The bonding structures of films corrected by Ar are quite similar with the results of FTIR analysis. This method is suitable for analyzing BCN films prepared in Ar-contained sputtering atmosphere, and is also suitable for analyzing the inner structure of films. There is an obvious deviation in bonding energies between the true value and adjusted by contamination carbon or by deposited monolayer Au. Key words: BCN filmsXPSchemical structurecharging effect