A new concept for mass production of large area thin-film silicon solar cells on glass_略d.pdf

Thin Solid Films 502 (2006) 300 – 305 /locate/tsf A new concept for mass production of large area thin-film silicon solar cells on glass B. Rech a,*, T. Repmann a, S. Wieder b, M. Ruske b, U. Stephan c a Forschungszentrum Ju¨lich GmbH, Ju¨lich, Germany b Applied Films GmbH and Co. KG, Alzenau, Germany c Forschungs-und Applikationslabor Plasmatechnik GmbH, Dresden, Germany Available online 1 September 2005 Abstract Thin-film silicon solar cells with up to 11.2% stable cell efficiency have been developed on ZnO coated glass substrates on laboratory scale using solely plasma enhanced chemical vapour deposition (PECVD) and magnetron sputtering as deposition techniques for all thin films. To transfer this concept towards large areas, we developed a novel PECVD electrode which proved its capability of providing 2 sized substrates. Microcrystalline silicon (Ac-Si:H) solar cells were homogenous amorphous and microcrystalline silicon films on ¨1 m realised with efficiencies up to 7.2%. The high open-circuit voltage V and fill factor FF of 520 mV and 71%, respectively, demonstrate that oc high quality Ac-Si:H material can be prepared with this large area electrode. Note that finally the entire thin-film structure–including all silicon, TCO and metal films–can be produced using one single