TCAD工具简介分析.pptVIP

ISE TCAD Training —— Overview ISE-TCAD Overview Menu A. What is TCAD? 10 minutes B. ISE TCAD Tool Overview 20 minutes A. What is TCAD? A.1 What is TCAD? A.2 Process simulation A.3 Device simulation A.4 TCAD in the semiconductor industry A.1 What is TCAD? 利用计算机仿真来开发和优化半导体工艺技术及器件 TCAD仿真工具求解基本的物理偏微分方程，如离散化的扩散及传输方程等来描述半导体器件中的the silicon wafer or the layer system 。 深层次的物理方法使得TCAD仿真有一个可预测的精度。因此，当开发或描述一种新的半导体器件或技术时，可以用TCAD仿真来替代费钱费时的测试晶片。 TCAD包括两个主要分支： process simulation and device simulation. A.2 Process simulation 基于物理方程仿真工艺步骤：如刻蚀、淀积、离子注入、热退火及氧化等。 硅晶片仿真部分被离散化（meshed）并且描述为一个有限元结构。 如热退火仿真中，每种杂质的复合扩散方程都要基于网格求解。 对 silicon oxide 生长的氧化仿真要考虑氧的扩散及拐角处的应力等。 Monte Carlo 技术通常用来仿真离子注入工艺。 A.3 Device simulation 器件被描述为网格化的有限元结构，每个节点有相关的属性，如材料类型material type, doping concentration, etc. 对每一个节点，计算其载流子的浓度、电流密度、电场、产生率及复合率等 (see Fig. 2). 电极区域作为边界条件，如所加电压等。 器件仿真求解泊松方程及载流子连续性方程（及可能的其他方程如，晶格与载流子温度方程）。 求解后，提取接触处的电流。 (see Fig. 3). A.3 Device simulation A.4 TCAD in the semiconductor industry TCAD simulations are widely used throughout the semiconductor industry. As technologies become more and more complex the semiconductor industry relies increasingly more on TCAD to cut costs and speed up the research and development process. In addition, semiconductor-manufacturing companies use TCAD for yield analysis, i.e., monitoring, analyzing and optimizing their IC process flows, as well as to analyze the impact of IC process variation. B. ISE TCAD Tool Overview B.1 ISE TCAD Tool Overview B.2 The ISE-TCAD Tool Suite B.1 ISE TCAD Tool Overview B.2 The ISE-TCAD Tool Suite GENESISe - The Framework Tool LIGAMENT - The Process Simulation Environment FLOOPS-ISE - The Process Simulator DEVISE - The Structure Editor MESH/NOFFSET3D - The Meshing Engines DESSIS - The Device Simulator DESSIS-Laser - The Laser Device Simulator INSPECT - The X-Y Plotting and Analysis Tool TECPLOT-ISE - The Visualizer OptimISE - The Optimizer GENESISe - The Framework Tool To design, organize, and ru