準分子雷射鍍製碳膜.PDFVIP

準分子雷射鍍製碳膜 1 2 2 方治國 何惠雯 余佳凝 1. 國立宜蘭大學機械與機電工程學系教授 2. 國立宜蘭大學機械與機電工程學系學生 摘要 碳膜主要是由元素碳所構成之薄膜鍍層，包括化學氣相沈積鑽石膜、石墨膜、無定形碳 膜(類鑽碳膜) 、及電漿高分子膜等。碳膜具有獨特且可調整之各種特性組合，包括高硬度及高 耐磨耗性、化學鈍性、及磨潤特性等。然而其其缺點是成膜製程通常須在真空系統進行，本研 究則於大氣環境及室溫下利用脈衝式雷射鍍製碳膜。 本研究使用ArF 準分子雷射(波長 193 nm)照射於浸泡在環己烷之單晶矽表面以鍍製碳 膜。鍍膜以原子力顯微鏡觀察其表面形貌，其平均粗糙度(Ra)約0.275 nm 。碳膜經拉曼光譜儀 (激發雷射波長532 nm)分析其結構特徵，除G band 外，可發現β-SiC 拉曼譜峰。 關鍵詞：準分子雷射、環己烷、拉曼光譜、原子力顯微鏡 1 Deposition of Carbon Films by Exvimer Laser Irradiation 1 2 2 Chih-Kuo Fang , Huei-Wun He , Jia-Ning Yu 1. Professor, Department of Mechanical and Electromechanical Engineering, National Ilan University. 2. Undergraduate Student, Department of Mechanical and Electromechanical Engineering, National Ilan University. ABSTRACT Carbon films are thin film coatings consisting predominantly of the chemical element carbon. Which include CVD diamond films, graphite films, amorphous carbon films (diamond-like carbon, DLC) as well as plasma polymer films. Carbon films possess unique and adjustable combination of properties such as high hardness and wear resistance, chemical resistance and good tribological performances. However, the disadvantage is that their deposition process generally need vacuum systems. In this study, carbon films have been produced through pulsed-laser deposition in the atmosphere at room temperature. ArF Excimer laser (λ= 193 nm) irradiation of a single-crystalline silicon surface immersed under cyclohexane liquid is demonstrated to form carbon films. Atomic force microscopy has been used to study