无镍201不锈钢溅射沉积金属钛膜研究-有色金属科学与工程.docVIP

201无镍不锈钢溅射沉积金属钛膜研究* 蓝德均1，黄双华2 （1. 攀枝花学院生物与化学工程学院 四川攀枝花 617000； 2. 攀枝花学院土木与建筑工程学院 四川攀枝花 617000） 摘要：采用常温直流磁控溅射法在廉价201无镍不锈钢表面沉积了纯钛薄膜。通过XRD和SEM分析了201上钛薄膜的结构和形态受沉积条件的影响。结果表明，在溅射功率为78.4W时钛薄膜由紧密排列的柱状晶构成，但功率过大薄膜反而疏松。多种工艺参数下，钛薄膜具有高度的择优取向，但其择优取向的晶面并不固定。XRD结果还表明由于钛原子的渗入，基底会发生较严重的晶格畸变。并探讨了以沉积量表征膜厚的可能性及工艺参数对薄膜沉积量的影响。 关键词：201无镍不锈钢，磁控溅射，钛薄膜，择优取向，沉积量 Investigation of Ti film Sputtering Depostion on 201 Stailess steel Free of Ni Lan Dejun1, Huang Shuanghua2 (1. Bioengineering Chemical Engineering College, Panzhihua University, Panzhihua 617000, China 2. School of civil engineering and architecture, Panzhihua University, Panzhihua, 617000, China) Abstract: Ti film was deposited at the room temperture by DC magnetron sputtering on low-cost 201 stainless steel free of Ni. The effects of deposition conditions on the structure and appearance of Ti film on 201 stainless steel were analysed through XRD and SEM. The results showed that the film microstructure were closely corelated with the depostion parameters. The closely arranging cyberlink crystal was observed at 78.4W of sputtering power, but porosity was being produced at stronger power. High orientation was determined by XRD but lattice plane with the orientation was not exclusive with defferent variable process parametres. It was also determined by XRD that the more serious lattice distortion of the base was found because of Ti atom infiltration. Moreover, the possibility was discussed that the film thick could be characterized by the deposition quantity, and the effects of parametres on the deposition quantity were discussed too. Keywords: 201 stainless steel free of Ni, magnetron sputtering, Ti film, orientation, deposition quantity 金属钛密度小，比强度高，抗腐蚀性好。在生理上无毒且惰性[1]，与人体组织结合良好，目前尚未发现对人体存在致敏、致畸变和致癌现象，是目前使用最多的生物相容性好的金属材料之一[2,3]。由于高的冶金与材料加工成本，金属钛在民用和工业方面还难以大量应用。目前普遍使用的抗环境腐蚀材料是各种型号的不锈钢材料。但在一些特殊环境中，即使性能最好的不锈钢也难以胜任。如在医用生物工程材料上，虽然不锈钢也是大量使用的骨骼修补材料之一，但在生物相容性和生理毒性方面还需要进一步改善[4-6]。因此，以普通钢材或不锈钢为基体，在其表面以适当的方式沉积一层金属钛薄膜，实现“以钢代钛”，大大改善一般不锈钢的抗腐蚀性，在医学上提