国产晶硅平板PECVD设备的优势(国外英语资料).docVIP

国产晶硅平板PECVD设备的优势(国外英语资料) PDF documents may have a poor browsing experience at the WAP end. It is recommended that you choose TXT, or download the source file to the native view. Advantage of domestic crystalline silicon tablet PECVD Dr. Wang baoquan SNEC in May, 2010 Booth location: W2 pavilion T2136 The technical advantage of the silicon tablet PECVD device is the competitive advantage of the ESSINDTM PECVD device in the northern microelectronic development tablet PECVD device confidential The technical advantage of the silicon tablet PECVD device is the competitive advantage of the ESSINDTM PECVD device in the northern microelectronic development tablet PECVD device confidential PECVD devices are used in silicon wafers solar cells PECVD (plasma enhanced chemical vapor deposition) technique is the use of plasma characteristics to control or influence gas instead With chemical reaction process on the surface of the material, and in the appropriate temperature (from room temperature to 500 ℃) under the deposition film. Crystalline silicon solar cell process Pretreatment of the printing of the PECVD sintered electrode printing etch diffusion The PECVD device is used to prepare the SiNx film The passivation properties prepare the sine attenuation properties confidential Short circuit current battery efficiency open circuit voltage PECVD equipment technique category The device structure is divided Plate type tube type The sedimentation principle is divided Direct method of indirect method Plasma Source SiH4, NH3 Plane loading board Hollow carbon box The graphite boat Plane loading board The graphite boat The function is distributed in different Chambers and the gas utilization is high automaticity high automaticity high production efficiency high automatic loading and unloading strip easy to realize equipment maintenance tedious The function is concentrated in the same furnace tube gas utilization low automaticity low automation degree low production efficiency low auto