薄膜技术Xuhai Zhang 04Thin-Film sputtering processes.pptVIP

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  • 2017-07-08 发布于浙江
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薄膜技术Xuhai Zhang 04Thin-Film sputtering processes.ppt

When one ion bombard the target, how many atoms of target would fly out? * 产额会影响沉积速率 * 能量交换时间控制 * 溅射产额随入射原子序数的增加而周期性增加 * 靶材表面制备成利于溅射的晶面,如何制备?压扎成板织构 * Target temperature * 沉积速率=有效溅射产额X溅射离子数 At low pressures, the cathode sheath is wide, ions are produced far from the target, and their chances of being lost to the walls is great. The mean free electron path between collisions is large, and electrons collected by the anode are not replenished by ion-impact-induced secondary-electron emission at the cathode. Therefore, ionization efficiencies are low and selfsustained discharges cannot be maintain

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