第9章_高科技厂房精密设备基座结构之微振动特性研究.pdfVIP

第七届中13建筑结构技术交流会重庆 高科技厂房精密设备基座结构之微振动特性研究 陈炳煌黄文宏 中华大学土木与工程信息学系博士候选人 李锡霖 台北市结构工程工业技师公会学术委员、中华大学土木与工程信息学系副教授 Abstract Inorderto the vibrationofhi—tech and improveproductsquality，thebackground factory semiconductormust be meettheneedof fac． building controlled’seriously．Tolargespace，those tendtobe inrecent withthe and floor torybuilding designed years large，spanhigh level．This of is in structure ambient this affectofnaturalfre- type costly vibration，problem．Inpaper，the dueto the is quency change foundationexamined tothesameseismic height，of according require．． ment．A time will dynamichistory be withSAP2000．Theback— analysisprocedureperformed ambientvibration fromthefloor testwillbeusedasan accel— ground signalgetting by．field input erationand the atthe will those fromfield、test． responsefoundation，topbe‘compared‘togetting Theresultshowsthatan limitis for existed ratio thisrati． up height／widthof—foundation．Beyond natural ofthefoundationinhorizontal o，the directionisclosetothenatural frequency frequency ofthe theresonance willbecomes building，and phenomenon obvious．Hence，the