纳米制造和测量技术产业化的研究 research on industrialization of nanofabrication and nanometrology.pdfVIP

第33 卷第 12 期 Vol.33, No.12 2006 年12 月 Opto-Electronic Engineering Dec, 2006 文章编号 1003-501X(2006)12-0015-04 纳米制造和测量技术产业化的研究 1, 2 1 ( 1. 中国科学院电工研究所 北京 100080 2. 中国科学院研究生院 北京 100039 ) 摘要 从加工尺度的连续性和加工技术的完整性这一新的角度 分析了纳米加工产业化面临的问 题 并提出了相应的解决方案多离子束聚焦投影技术 多离子束聚焦投影技术将填补传统微机 加工技术和半导体图形技术之间0.5~5µm 的加工空白 并会在1~100nm 尺度间实现自上至下技术 和自下至上技术的有机结合 纳米测量技术产业化的研究中 以提高扫描探针技术的样品质量作 为出发点 在聚焦离子束和扫描电镜平台上集成 Ar 离子束的 三束 显微镜能有效降低样品的 损伤 大大推动了纳米测量技术的发展 关键词 多离子束聚焦投影 掩模板 纳米制造 纳米测量 中图分类号 TN305 文献标识码 A Research on industrialization of nanofabrication and nanometrology LI Wen-ping1, 2 GU Wen-qi1 ( 1. Institute of Electrical Engineering, the Chinese Academy of Sciences, Beijing 100080, China; 2. Graduate School of the Chinese Academy of Sciences, Beijing 100039, China ) Abstract : Scale continuity and technological integrality of nanofabrication is studied in this paper. Projection focused ion multi-Beam was brought forward to solve problems appeared in industrialization of nanofabrication. It closes the presently existing machining gap of 0.5~5µm between the classical micro machining technologies and semiconductor patterning technologies. It has achieved the combination of top-down structuring with selective bottom-up self-assembly techniques during the scale of 1~100nm. As regard to nanometrology, scanning probe technology is researched in detail. A “three-beam” system can effectively reduce sample damage by integrating Ar ion beam into a dual-beam system of focused ion beam and electron beam, which will accelerate