characteristics and photocatalytic properties of thin film prepared by sputter deposition and post-n+ ion implantation特点和薄膜的光催化性能由溅射沉积和post-n +离子注入.pdfVIP

Hindawi Publishing Corporation Advances in Materials Science and Engineering Volume 2012, Article ID 923769, 7 pages doi:10.1155/2012/923769 Research Article Characteristics and Photocatalytic Properties of TiO2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation Haider A. Shukur,1 Mitsunobu Sato,2 Isao Nakamura,3 and Ichiro Takano1 1 Department of Electrical Engineering, Faculty of Engineering, Kogakuin University, 2665-1, Nakano-machi, Hachioji-shi, Tokyo 192-0015, Japan 2 Division of Basic Liberal Arts, Kogakuin Uni