2012年平板显示行业高峰论坛-氧化物半导体TFT的现状及未来挑战-细野秀雄(英).pdfVIP

Recent Advances in Oxide Semiconductors for FPD Applications Hideo HOSONO Tokyo Institute of Technology OUTLINE 1. Progress in Oxide Semiconductors and TFTs Application 2. Origin of Negative Bias Illumination Stress (NBLS) Instability in TAOS-TFTs 3. LT-processed Oxide-TFT 4. Bipolar Oxide TFTs 5.Novel oxide semicond. for Electron Injection Layer in OLED Oxide TFT and FPD Application 1950 1960 1970 1980 1990 2000 2010 1948