毕业设计论文-喷涂工艺对氮化硅涂层品质的影响.docVIP

喷涂工艺对氮化硅涂层品质的影响 摘 要 铸造多晶硅生产流程中的第一道工序就是坩埚涂层的喷涂。工业中通常使用的坩埚是石英或石墨坩埚，熔融硅与坩埚接触时不可避免的产生反应粘连，同时坩埚中的杂质也会进入硅熔体中。高浓度的杂质，如C、O、Fe等将使少子寿命显著降低，影响电池性能。通常在坩埚上涂敷涂层使熔体与坩埚壁隔离，来减少反应粘连使锭顺利脱模，并阻止坩埚中的杂质在过程中进入硅中Si3N4自扩散系数低，且耐高温性能和化学稳定性良好，抗杂质扩散能力强，与熔硅不发生反应，通常被用来作为多晶硅铸造的涂层材料。 坩埚涂层的制备方法很多，现在通常采用成本低廉的氮化硅涂层制备技术，它是在石英坩埚内壁上喷涂氮化硅涂层的将涂有氮化硅涂层的石英坩埚在下进行烧结，形成结构更加致密的氮化硅层。Si3N4 Coating Influenced By Spraying Technology ABSTRACT In the process of mc-Si purification by Physical Metallurgical Method, spraying Si3N4 coating is the first working procedure, crucibles, typically graphite or quartz crucibles have been used as support of melting silicon. However, in the casting process, there are reaction adhesions on the interface of melting silicon and crucible. Moreover,high density of impurity,such as C,O,Fe,Ca,which plays a crucial role on the degradation of mc-Si solar cells performance,are usually incorporated through the contact of the melt with the crucible walls. Usually coating has been spayed on the crucible wall as release agent to avoid melting Silicon contacting with the crucible wall directly, eventually decrease the impurity diffusion from crucible. High purity Si3N4 has been used as typical coating materials in the mc-Si casting process for its low self-diffusion coefficient, good high temperature resistance and chemical stability. There are kinds of methods to fabricate coating; now we adopt low cost method for Si3N4 coating. In this study, we adopt the technique that spraying Si3N4 on the wall of crucible directly. We sinter the crucible with Si3N4 coating at the temperature of 1050℃. But this technique lacks test technology; the traceability of craftwork is very bad. There are adhesions on the interface of melting Silicon and crucible. More over, it can bring in impurity and crackle; affect the products’ quality. So we hope to change the proportion of pure water and Si3N4, warm-up temperature and the way of mixing liquor to optimize our products. Investigation results show tha