光刻机工作台超精密运动与同步控制.pdfVIP

第 47 卷第 11 期 机 械 工 程 学 报 Vol.47 No.11 2 0 1 1 年 6 月 JOURNAL OF MECHANICAL ENGINEERING Jun. 2 0 1 1 DOI ：10.3901/JME.2011.11.185 光刻机工作台超精密运动与同步控制* 1 1 2 滕 伟 柳亦兵 穆海华 (1. 华北电力大学机电工程研究所 北京 102206 ； 2. 华中科技大学机械科学与工程学院 武汉 430074) 摘要：以同步扫描的运动性能为目标，研究针对步进扫描投影光刻机工作台的超精密运动与同步控制策略。结合工作台的结 构特点，提出一种粗、微复合运动控制方法，即：微动台纳米级微动，粗动台微米级跟随运动；以硅片台、掩模台的三阶轨 迹规划与轨迹重叠为基础，进行扫描过程中的同步状态规划；为实现纳米级的同步运动精度，进行硅片台与掩模台的动态特 性比较，在此基础上提出工作台交叉反馈的同步控制策略，使掩模台实时跟踪硅片台的运动趋势，并设计同步误差模型进行 运动性能评估。该方法已在 100 nm 步进扫描投影光刻机中得到实际应用，并取得良好效果。 关键词：工作台 运动控制 同步状态 同步控制 中图分类号：TP39 Ultra-precision Motion Control and Synchronization Control for Stage of Lithography TENG Wei 1 LIU Yibing 1 MU Haihua 2 (1. Institute of Electromechanical Project, North China Electric Power University, Beijing 102206; 2. College of Mechanical Science Engineering, Huazhong University of Science Technology, Wuhan 430074) Abstract ：A strategy of ultra-precision motion control and synchronization control for stage of step scan lithography is studied, aiming at the motion performance of synchronization scan. Considering the stage structure, a control method based on rough-fine motion is presented, which is described as: fine-motion stage moves nanometer level and rough-motion stage follows at micrometer level. The synchronization state of stage during scanning is planned based on the 3rd trajectory planning and trajectory overlapping. To realize the synchronous motion precision of nanometer level, a cross-feedback control strategy is proposed which makes the retile stage track the wafer stage motion trend based on the difference of dynamic characteristic between wafer stage and retil