面向半导体湿法制程的超洁净流控技术综述.pdfVIP

面向半导体湿法制程的超洁净流控技术综述 摘要 ：湿法工艺作为半导体工艺的重要组成部分 ，通过化学品(酸、碱、溶剂等)与超纯水等液体介质， 对晶圆表面进行刻蚀、清洗等处理，其制程需避免颗粒、金属 、离子、细菌等污染物带来的工艺缺陷 。为此，湿 法工艺相关的化学品系统、超纯水系统与制程装备均需采用超洁净流控部件，但相关产品被国外垄断，我国 对该技术领域的研究仍处起步阶段 。该研究首先阐述了半导体湿法制程对超洁净流控部件的需求,剖析了 该类部件的主要技术特征 。进而，重点介绍了磁悬浮泵、波纹管泵 、隔膜阀以及超声波流量传感器等超洁净 流控部件的工作原理与发展历程,并分析了其关键技术与研究现状 。最后，对超洁净流控技术的发展做出了 展望。 关键词 ：半导体；湿法制程;超洁净流控;磁悬浮泵;波纹管泵 ；隔膜阀；超声波流量传感器 Review of Ultra-clean Flow Control Technology in Wet Process of Semiconductor Abstract : Wet processing ( etching and cleaning, etc. ) in the semiconductor fabrication treats the wafer surface through chemical liquids such as ( acid, alkali, solvent, etc. ) and ultrapure water. The above processes need to avoid the defects caused by particles, metals, ions, bacteria and other contaminants. Therefore, the chemical and ultrapure water delivery systems, as well as the process equipment, need to use ultra-clean flow control parts, which are still monopolized by foreign countries and according research in China is still in its infancy. This review paper firstly describes the requirements of ultra-clean flow control parts for the wet process, and then analyzes their main technical characteristics. Furthermore, the working principle and development history of several typical parts including magnetic levitation pump, bellows pump, diaphragm valve and ultrasonic flow sensor are introduced. Their key technologies and according research status are also analyzed. Finally, the future development of the technology is prospected. Key words： semiconductor, wet process, ultra-clean flow control, magnetic levitation pump, bellows pump, diaphragm valve, ultrasonic flow sensor 引言 流量传感器、管路与接头组成的控制回路实现工艺介 半导体制造涉及的工艺复杂、工序繁多，往往需要 质的混液、循环、分配与输送;管路中往往装有过滤器, 数百种化学试剂与气体参与各类制程的物理作用与化 且高温工艺还需辅以加热器、热交换器等对介质温度 学反应 。同时，一部分工艺需要依赖恒温、恒压、超纯、