世界半导体生产机台安全生产设计验收标准英文版.docVIP

An independent organization testing for safety and performance All services undertaken subject to the following general policy: Reports are submitted for exclusive use of the clients to whom they are addressed. Their significance is subject to the adequacy and representative character of the samples and to the comprehensiveness of the tests, examinations or surveys made. No quotations from reports or use of GS3 憇 name is permitted except as expressly authorized by GS3 in writing. Global　Ｓｅmｉcｏnducｔor　Ｓafety Seｒvicｅs， LＬC SＥMI　Ｓ2-93A　Produｃｔ Safetｙ Ａｓseｓsmeｎt Fｉnaｌ Report 世界半导体生产机台安全设计验收标准 Aｐpｌieｄ Materialｓ Ｃhemical Ｍechaniｃal Poliｓｈing　Sｙstｅm Mｏdｅl： Mｉｒｒa　Trak CMP工艺应用材料 Jｕne　19, 199８ Pｒepareｄ ｆｏr： Ａpｐｌied Materiaｌｓ ３11１ Cｏrｏnado Drｉve Santａ Cｌara, CA 95054 Pｒepaｒeｄ bｙ: Global Semicｏnductｏｒ　Sａfeｔy Seｒvｉｃes，　LLC 1３1３ Ｇｅnｅvａ Driｖｅ Ｓunｎyvale, CA 9４089 ＧS3 Job No. 9８0029 GＳ３　Doｃuｍｅnt Ｎo. ９80029Ｆ２ Doc. No. 980029F / June 19, 1998 FILENAME 世界半导体生产机台安全设计验收标准(doc111)英文.doc/ Page PAGE 13 Copyright ?1997 by GS3, LLC. All rights reserved. Ｃｌieｎt - Cｏnｆｉdential 　 　 　　 　　　　　　 　 　 　　 　 　 　 　 　　 　　 保密合约 Ｔｈｅ information used ｔｏ　prepare　thｉs　ｒｅport was baｓｅd on ｉntｅrvieｗs with Applied　Materｉals enｇineeｒs. Tｈｅ iｎformａtion wａs　aｌso bａsed ｏｎ inspｅｃtions ｏf ｔｈｅ Chemiｃal Mｅｃｈaｎｉｃａl Ｐｏlｉｓhing Syｓtem， Ｍodel：　Mirra Traｋ。 Tｈrmａtion ｗａｓ ｇatheｒed oｖer the ｐｅｒiod bｅtween Ｆｅbruary ２， 1998 and Fｅbruary 4,　199８,　and duｒing a ｒe-inspeｃtｉoｎ of the ｓysteｍ on　Jｕne ３， １998。　A prｅｌｉｍinaｒy ａｓsessmｅｎt of the syｓtem was　ａlso　peｒfoｒmed　ｏn Sepｔeｍbeｒ　25, 19９６ tｈroｕgh　Ｓeptembｅｒ 26， 1996 anｄ　ｔhe rｅsｕlts of　ｔhｉs evaluation weｒｅ also ｕseｄ. Ａll　obserｖａｔioｎｓ　aｎd ｒｅcｏmｍｅｎdations　are　bａsｅｄ　ｏn ｃoｎdｉtｉons and dｅscriptｉonｓ　of thｅ Chｅmicaｌ Meｃｈanicaｌ　Polｉsｈinｇ Ｓysｔｅｍ,　Modｅl: Mirra Traｋ,　durinｇ ｔhe ｔiｍe of　dａta ｃｏllection aｎd　upon infｏrmａｔiｏｎ made avａｉlaｂlｅ　tｏ Glｏbａl　Ｓｅｍicｏｎｄuｃｔor　Safeｔｙ Sｅrvｉces． Tｈis report’ｓ ｓiｇｎifｉｃａncｅ is　subｊeｃｔ tｏ t