一种光聚合共混树脂抗原子氧侵蚀的机理.pdfVIP

22 3 Vol.22 No.3 2 0 0 8 6 CHINESE JOURNAL OF MATERIALS RESEARCH June 2 0 0 8    ∗     ( 100083) Æ A E–44 ES–06 , ; , , . , C (SiO ) , x SiO2 , . , , H O , . 2 , . , , , , , O631, TQ323  1005-3093(2008)03-0251-06 Atomic oxygen erosion resistance mechanism of a kind of UV–cured blended resins YANG Guang∗∗ HUANG Pengcheng (School of Materials Science and Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100083) * Supported by Space Science and Technology Innovation Foundation of China. Manuscript received September 3, 2007; in revised form December 30, 2007. ** To whom correspondence should be addressed, Tel:(010 E–mail: yangguang@buaa.edu.cn ABSTRACT A resin mixture of bisphenol A epoxy resin (E–44) and silicone–epoxy resin (ES–06) were cured via cationic photopolymerizations using a diaryliodonium salt as initiator and a polyol as chain transfer agentThe chemical and physical changes of the surface of the UV–cured blended resins after exposure to atomic oxygen (AO) were characterized. The results show that the UV–cured blended resins exhibited excellent AO resistance. After UV irradiation polymerization the surface of the blended resins had been partially oxidized to a silicon oxycarbide layer by UV–assisted ozonolysis. AO exposure of the oxidized UV–cured blended resins produces a thin SiO2 layer on the surface, which serves as a p