具有选择性发射极的太阳能电池.pdfVIP

SELECTIVE EMITTER FOR INDUSTRIAL SOLAR CELL PRODUCTION: A WET CHEMICAL APPROACH USING A SINGLE SIDE DIFFUSION PROCESS 1 1 1 1 1,2 A. Dastgheib-Shirazi , H. Haverkamp , B. Raabe , F. Book , G. Hahn 1 University of Konstanz, Department of Physics, P.O. Box X916, 78457 Konstanz, Germany 2 also with Fraunhofer Institute for Solar Energy Systems (ISE), Heidenhofstr. 2, 79110 Freiburg, Germany Author for correspondence: amir.dastgheib-shirazi@uni-konstanz.de, Tel.: +49 7531 882088, Fax: +49 7531 883895 ABSTRACT: This work describes the implementation of a novel process for a single diffusion selective emitter fabrication on mono- and multicrystalline silicon solar cells. To create a selective emitter structure a wet chemical route for an emitter etch back process has been applied. The areas of the wafer that are intended for front side metallization are shielded from etching by an acid resistant etch barrier. The emitter etch back and the removing of the etch barrier are implemented by a wet chemical process. By means of successfully transferring the described selective emitter structure on a standard screen printed cell process an increase of efficiency of more than 0.3 %abs. has been achieved. Keywords: Selective Emitter, Single Diffusion Process, Emitter Etching 1 INTRODUCTION deviation the homogeneity of the etched-back emitters could be assessed. Today the usually applied homogeneous emitter in