电子回旋共振等离子体辅助脉冲式沉积氧化铝薄膜的研究.pdfVIP

第 30 卷 　第 3 期 真 　空 　科 　学 　与 　技 　术 　学 　报 　　　　　　　 　　　　　　　　　　　 2010 年 5 、6 月 CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY 293 　 电子回旋共振等离子体辅助脉冲式 沉积氧化铝薄膜的研究 桑利军 　张跃飞 　陈　强 　李兴存 (北京印刷学院印刷包装材料与技术北京市重点实验室 　北京 　102600) Growth of Al O Fil ms by Pulsed Electron Cyclotron Resonance 2 3 Plasma Deposition Sang Lij un ,Zhang Yuefei ,Chen Qiang ,Li Xingcun ( Key L aboratory of B eij ing f or Grap hic Packaging M aterial and Technology , B eij ing Institute of n Grap hic Communication , B eij ing 102600 , China) c . 　　 Abstract 　The Al O films were grown by pulsed electron cyclotron resonance plasma deposition at room temperature 2 3 on Si substrates with trimethylaluminum and oxygen as the precursor and oxidant ,respectively . The impacts of film growth m conditions on the quality of the film were studied . The microstructures and stoichiometries of the films were characterized with Xray diffraction ,Xray photoelectron spectroscopy ,scanning electron microscopy ,atomic force microscopy and high o resolution transmission electron microscopy . The results show that the fairly smooth , compact Al O films with a thickness c 2 3 of 80 nm are amorphous. The sharp interface of the Al O fi