Large_Area__Few-Layer_Graphene_Films_on_Arbitrary_Substrates_by_Chemical_Vapor_Deposition.pdf

NANO LETTERS Large Area, Few-Layer Graphene Films 2009 Vol. 9, No. 1 on Arbitrary Substrates by Chemical 30-35 Vapor Deposition Alfonso Reina,† Xiaoting Jia,† John Ho,‡ Daniel Nezich,§ Hyungbin Son,‡ Vladimir Bulovic,‡ Mildred S. Dresselhaus,‡,§ and Jing Kong*,‡ Department of Materials Science and Engineering, Department of Electrical Engineering and Computer Science, Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 Received June 25, 2008; Revised Manuscript Received October 30, 2008 ABSTRACT In this work we present a low cost and scalable technique, via ambient pressure chemical vapor deposition (CVD) on polycrystalline Ni films, to fabricate large area (∼cm2) films of single- to few-layer graphene and to transfer the films to nonspecific substrates. These films consist of regions of 1 to ∼12 graphene layers. Single- or bilayer regions can be up to 20 µ m in lateral size. The films are continuous over the entire area and can be patterned lithographically or by prepatterning the underlying Ni film. The transparency, conductivity, and ambipolar transfer characteristics of the films suggest their potential as another materials candidate for electronics and opto-electronic applications. Graphene is the hexagonal arrangement of carbon atoms evaporated polycrystalline Ni. Beca