《《薄膜材料复习题》》.docVIP

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《《薄膜材料复习题》》.doc

1. Please depict the effects of ion bambardment in the processes of film growth and plasma etching. 2. Please summarize the deposition methods, properties, and application of diamond films. 3. What is the distinction between PVD from CVD? 4. Please describe the principle of magnetron sputtering according to the following figure. 5. Please explain the working principles of Rotary vane pump, Diffusion pump, and Cryopump. 6.(a) Please quantitatively discuss why a negative self-bias emerges on an electrode in the RF discharge plasma, (Assuming Townsend secondary-electron coefficient γe is 0.1

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