PECVD法沉积类金刚石膜的研究X.pdf

2008全国荷电粒子源、离子束学术会议论文集 PECVD法沉积类金刚石膜的研究 杨莉陈强’ (北京印刷学院印刷包装材料与技术北京市重点实验室北京102600) 摘要 以C2H2为碳源，Ar气为辅助气体，利用射频等离子体化学气相沉积的方法在载玻片和PET 膜上制各了类金刚石(diamond．1ike 测量仪(DSAl00)对类金刚石薄膜的结构、成分进行了细致的分析；利用原子力显微镜(AFM) 分析了薄膜的表面形貌；同时，透氧测试来研究薄膜的阻隔性能与薄膜的结构之间的关系。另外， 还利用摩擦磨损仪对薄膜的机械性能进行了研究。实验结果表明，PECVD制备的DLC薄膜比较致 密、均匀。有较好的耐磨性能。 关键词PECVD类金刚石膜结构分析 中图分类号：TB43 文献标识码：A 文章编号： GrowthofDLCFilmsPlasmaEnhanced by Chemical VaporDeposition Li，Chen Yang Qiang’ Lab and Institute 102600，China ofGraphic ofplasmaPhysicsMaterials，Beijing Communication,Beijing With asthecarbonsourceandAras AbstractC2H2 plasmaforminggas，diamond-likecarbon(DLC) filmWas on substrateandPETfilmsradio chemical depositedglass by frequencyplasma-enhancedvapor structureand was FTIR ofthefilm andwater deposition(RE—PECVD)．The analyzedby spectroscope contact thesurface Wasdetected atomicforce angle(WCA)，respectively．Andmorphology through relationsbetweenbarrier andDLCfilmstructurewerecharacterized microscope(AFM)．The properties by measurement oftheDLCfilm rate(OTR)test．Besides，theoftribologicalperformance oxygenpermeation work．Theresults thefabricatedDLCfilmwasdistributed wasalso inthis showthat compactly presented and anddemonstratesa wear