脉冲激光沉积(PLD)技术和应用课题.pptVIP

下载本文档

4
0
约5.89千字
约 35页
2017-05-06 发布于湖北
举报
版权申诉

脉冲激光沉积(PLD)技术和应用课题.ppt

1、原创力文档（book118）网站文档一经付费（服务费），不意味着购买了该文档的版权，仅供个人/单位学习、研究之用，不得用于商业用途，未经授权，严禁复制、发行、汇编、翻译或者网络传播等，侵权必究。。
2、本站所有内容均由合作方或网友上传，本站不对文档的完整性、权威性及其观点立场正确性做任何保证或承诺！文档内容仅供研究参考，付费前请自行鉴别。如您付费，意味着您自己接受本站规则且自行承担风险，本站不退款、不进行额外附加服务；查看《如何避免下载的几个坑》。如果您已付费下载过本站文档，您可以点击这里二次下载。
3、如文档侵犯商业秘密、侵犯著作权、侵犯人身权等，请点击“版权申诉”（推荐），也可以打举报电话：400-050-0827(电话支持时间：9:00-18:30)。
4、该文档为VIP文档，如果想要下载，成为VIP会员后，下载免费。
5、成为VIP后，下载本文档将扣除1次下载权益。下载后，不支持退款、换文档。如有疑问请联系我们。
6、成为VIP后，您将拥有八大权益，权益包括：VIP文档下载权益、阅读免打扰、文档格式转换、高级专利检索、专属身份标志、高级客服、多端互通、版权登记。
7、VIP文档为合作方或网友上传，每下载1次，网站将根据用户上传文档的质量评分、类型等，对文档贡献者给予高额补贴、流量扶持。如果你也想贡献VIP文档。上传文档

Ways to deposit thin films Pulsed Laser Deposition Pulsed Laser Deposition Target: metals, semiconductors… Laser: UV, 10 ns pulses Vacuum: Atmospheres to ultrahigh vacuum Film thickness: typically 100-200 nm. Deposition rate: 0.1 nm/pulse Pulsed Laser Deposition Advantages of PLD Exact transfer of complicated materials Flexible, variety, easy to implement Easy to prepare target Epitaxy at low temperature Fast growth rate Disadvantages of PLD Uneven coverage High defect or particulate concentration Not well suited for large-scale film growth Mechanisms and dependence on parameters not well understood Processes in PLD Laser superheats subsurface layer before surface reaches evaporation point Surface breaks apart into large (micron-sized) globule particles when the subsurface expands. Pressure Expulsion Expansion of plume causes sudden drop in pressure just above surface Shock wave pulls droplets of liquid off of surface Exfoliation Thermal shock causes irregularities in surface to break off Surface morphology Previous ablation Particulates are randomly shaped Process parameters substrate temperature the target-substrate distance ambient oxygen pressure and annealing temperature target consistency pulse laser energy laser frequency Characteristic properties of Y2SiO5:Ce thin films grown with PLDE. Coetsee, J.J.Terblans,H.C.Swart, Physica B 404(2009)4431–4435 Opportunities Ultrahigh quality films Circuit writing Isotope Enrichment New Materials Nanoparticle production Opportunities Ultrahigh quality films Circuit writing Isotope Enrichment New Materials Nanoparticle production Opportunities Ultrahigh quality films Circuit writing Isotope Enrichment New Materials Nanoparticle production DARPA MICE Program(U.S. Defense Advanced Research Projects AgencyMesoscopic Integrated Conformal Electronics program) Opportunities Ultrahigh quality films Circuit writing Isotope Enrichment New Materials Nanoparticle production Opportunities Ultrahigh quality films Circuit wri