BDD电极的制备及其特性研究研讨.docxVIP

PAGE  -  PAGE 4 -  PAGE I BDD电极的制备及其特性的研究 摘 要 本篇论文使用了热丝化学气相沉积法（HFCVD）制备掺硼金刚石(BDD)膜电极，接着对掺硼金刚石薄膜的生长特性进行深入的研究和仔细的分析。然后我们对制备获取的掺硼金刚石电极，采用SEM、Raman光谱、XRD等手段表征了掺硼金刚石的微观形貌及其结构，并对BDD电极的Hall效应分析 、BDD电极的充放电性能分析、 BDD电极的阻抗分析、BDD电极的动力学分析和用循环伏安法对BDD电极的电势窗口分析。 通过实验表明:这次实验制成了质量较好的掺硼金刚石膜电极。然后对其进行电化学性能的测试发现其的比电容比较大，可用来做优良的电极材料。 关键词：掺硼金刚石 HFCVD 电化学 Hall效应 Synthesis and Properties of Boron-doped Diamond Film ABSTRACT This paper uses a hot filament chemical vapor deposition (HFCVD) Preparation of boron-doped diamond (BDD) film electrode, then on boron-doped diamond thin film growth characteristics of in-depth research and careful analysis. Then boron-doped diamond electrode preparation we get, using SEM, Raman spectroscopy, XRD and other means to characterize the microstructure of boron-doped diamond of its structure, and studied the Hall effect analysis BDD electrode sheet resistance BDD Electrodes, BDD electrode impedance analysis, dynamic analysis BDD electrodes and electrode potential window analyzed by cyclic voltammetry. Experiments show: the experiment is made of good quality boron-doped diamond film electrodes. And then found its specific capacity is relatively large, it can be used for its excellent electrochemical properties of the electrode material testing. Key Words: Boron-doped diamond HFCVD Electrochemical Hall effect  目 录  TOC \o 1-3 \h \z \u  HYPERLINK \l _Toc421111380 第一章 绪论  PAGEREF _Toc421111380 \h 1  HYPERLINK \l _Toc421111381 1.1 金刚石的晶体结构  PAGEREF _Toc421111381 \h 1  HYPERLINK \l _Toc421111382 1.2 金刚石的性质及应用  PAGEREF _Toc421111382 \h 2  HYPERLINK \l _Toc421111383 1.3 掺硼金刚石的应用  PAGEREF _Toc421111383 \h 2  HYPERLINK \l _Toc421111384 1.4 BDD电极的性质及应用  PAGEREF _Toc421111384 \h 3  HYPERLINK \l _Toc421111385 1.5 本文的工作内容  PAGEREF _Toc421111385 \h 5  HYPERLINK \l _Toc421111386 第二章 实验部分  PAGEREF _Toc421111386 \h 7  HYPERLINK \l _Toc421111387 2.1 设备介绍  PAGEREF _Toc421111387 \h 7  HYPERLINK \l