newnergy13-工艺总结.pptVIP

工艺总结 超大规模集成电路发展到了亚微米时代，光靠技术的改进已不能提高产品的成品率，环境净化已日益显示出重要性。在集成电路成品率方面，70%是由于污染造成器件失效。而最大的污染物来源则是操作者本身。 超净车间使用； 操作者的净化； 无人化操作； 等等… UV-Ozone Clean ? Effective way to remove hydrocarbon, although the surface is oxide passivated. ? Surface excitation process ? Absorbed impurity + hν (2000-3000 ? UV) Excited impurity ? Gas-phase excitation process ? O2 + hν (1849 ? UV) 2O ? O + O2 O3 ? O3 + hν (2537 ? UV) O + O2 ? Excited impurity + (O + O3) Volatile compound ? The subsequent HF/H2O vapor or Ar/H2 plasma cleaning can remove surface oxide. HF/H2O vapor clean ? HF dip promotes a hydrogen-passivated surface ? HF/H2O vapor clean induces a fluorine-terminated surface * * 超净车间： 在硅片上附有异物，就会对器件制作带来不良影响。一般说：当异物大小为加工尺寸的1/5-1/10时就会产生不利影响。也就是说，对于目前的半导体硅平面技术而言，0.1μm以上的异物就是有害物质了。超净车间的标准早在20世纪70年代就由美国定下来了。它对房间内的温度、湿度、照度、换气方式等均有严格规定。而级别定义则与房间内尘埃粒子的大小及数目有直接联系。例如：Class10,000要求房内粒径大于0.5μm的粒子数要小于10000/ft3 ， 而粒径大于5 μm 的粒子数要小于6.5/ft3。以前最高级别是Class100。 What is a Cleanroom? A clean environment designed to reduce the contamination of processes and materials. This is accomplished by removing or reducing contamination sources. Principles of the Clean Environment ? Air is highly (HEPA) filtered (99.99% @ 0.3μ) ? Layout should minimize particle sources in filtered air stream ? Air flow should remove most particles generated by process Types of Contamination ? Particulate Dust, skin, hair, makeup… ? Chemical Oil, grease, metal ions, perfume… ? Biological Bacteria, fungi, rodents??? ? Radiation Ultraviolet light… Particle Characteristics ? 50 micron particles are visible ? Average human hair is about 100 microns ? Time to fall 1 meter in still air – 33 seconds for 10 micron particle – 48 minutes for 1 micron particle ? Humans generate 1x105 particles per minute when motionless (fully gowned) ? Humans can generate 1x106 particles when walking in the cleanroom Contamination Sources ? People ~75% ? Ventilation ~15% ? Room