半导体NIKONStepalingnment.docVIP

NIKON Step-and-Repeat Exposure System (NSR) 兼职广告任务网 Introduction This document describes how to create the alignment marks on your mask for multi-level exposures on the Nikon stepper. You will need to create your own configuration file on the Nikon, so it knows where to find your alignment marks and where to expose on the wafer. Most of the file-creation procedure is described in the Nikon System Operator Training Manual and the instruction sheet attached to the Nikon. The first exposure has nothing to align to, so theres not much to say about it. Just make sure that you have a reticle and procedure in the file with an exposure number of 1. The second (and later) exposures align to the marks from the first exposure. Thus, you will need to create a reticle and procedure in the file with an exposure number of 2 (or higher) and include information on where the alignment marks were on the first exposure. You should start by using SNFMAN as your APF (which describes how the Nikon searches for the alignment marks). ? Nikon Alignment Targets The Nikon stepper requires several different types of alignment targets, or marks, to be present in each exposure field. There are three methods of alignment available for the NSR: Global Alignment, Step Alignment and Enhanced Global Alignment. Each type of alignment requires a different type of mark. In addition to wafer and exposure field alignments, the Nikon has several advanced alignment measurement capabilities. For more information, see the Nikon manual and the recommendations at the end of this section. Each exposure field pattern can contain: Wafer alignment marks (WX, WY, Wtheta, WR) to align the wafer to the Nikon microscopes Laser Step Alignment marks (LSAX, LSAY) to align each exposure field (step), and also for some advanced measurements Step alignment marks (SX, SY) for advanced measurements, and as a fall-back reference if it cant find the Laser Step Alignment marks The Nikon always requires at least the