粉末靶磁控溅射制备ZnxSn1-xO薄膜.docVIP

摘 要 透明导电的氧化锌锡薄膜是用射频磁控溅射法以混合的氧化物粉末为靶制备而成的。其物质组成是与这些靶材相似的。它的形态结构是近似100nm晶粒大小的柱状结构,微观结构是非晶形的或纳米晶，域大小约20-30nm。薄膜的平均透射率在可见波长超过85%以上。这种薄膜的自由带点载体的浓度和迁移率分别达到了1019cm-3和5.55-53cm2/Vs，薄膜的电阻率在10-2Ωcm范围之内。 关键词：多组分薄膜；透明导电氧化物薄膜；粉末靶；射频磁控溅射 ABSTRACT Transparent conductive zinc and tin oxide films (ZnxSn1-xO TCO) were prepared by RF magnetron sputtering from the mixed oxide powder targets. The compositions of the films were similar to those of the targets. The morphological structures of the films were columnar in approximate 100 nm grain sizes, and microstructure were either amorphous