汤有纶-20121027-浅谈电子特气发展趋势totzbg20121026案例分析.pptVIP

Product Name Purity Packaging Applications ClF3 ≥99.9% Cylinder (3.4L, 10L, 40L, 88L)Material: Stainless steel LP-CVD chamber cleaning gas 20%F2/80%N2 F2 :≥99.9% N2 : ≥99.999% Cylinder (10L, 47L), Bundle Material: Manganese steel LP-CVD chamber cleaning gas HF ≥99.999% Cylinder (3.4L, 10L, 40L) Material: Stainless steel Etching gas, LP-CVD chamber and exhaust pipe cleaning gas CentraL Glass（中央硝子)相关产品 Cleaning Gases for Semiconductors and Liquid Crystal Manufacturing Equipment CVD Process Gases for Semiconductors CentraL Glass（中央硝子)相关产品 Product Name Purity Packaging Applications SiH(CH3)3(Trimethylsilane) ≥99.995% Cylinder (10L, 47L)Material: Manganese steel SiC, SiOC, SiO2, SiN membrane materials Si(CH3)4(Tetramethylsilane) ≥99.995% CylinderMaterial: Stainless steel CentraL Glass（中央硝子)相关产品 Product Name State at room temperature Boiling point [°C] CAS No. Applications GeF4 Gaseous -19°C 7783-58-6 Implantation material, SiGe material IrF6 Solid 53°C 7783-75-7 Electrode material Other Fluorine Products CentraL Glass（中央硝子)相关产品 Organic Metallic Compounds Making full use of the cylinder business experience gained through our work with fluorine gases, Central Glass is also working to develop non-fluorine products. We supply Hf, Zr, Ti, Si, Ta and other compounds as precursors for the MOCVD/ALD technique, and we exploit our proprietary purification and analytical technologies to the full to attain a high purity. In particular, we have developed a technique for removing Zr from Hf compounds which has been difficult to do as Zr and Hf are of the same family of elements. CentraL Glass（中央硝子)相关产品 Organic Metallic Compounds——Hafnium Precursors Product Name State at room temperature Boiling point [°C] Purity CAS No. Applications Hf[N(CH3)2]4[TDMAH] Solid (melting point is 28°C) 40°C/0.1Torr 99.999%* （* Zr Excluding density Standard Grade: Zr100 wt.ppm High Pure Grade: Zr10 wt.ppm Ultra High Pure Grade: Zr1 wt.ppm ） 19782-68-4 HfO2 ,HfAlON, HfSiON layer materials Hf