2016工艺制程简介.pptVIP

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  • 2016-12-03 发布于北京
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2016工艺制程简介

a-Si TFT array process – step 2 a-Si TFT array process – step 4 DC Sputter deposition PECVD原理 Rubbing Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. Rubbing 动作 摩擦轮 平台 玻璃 Process Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. Spacer Spray Short Dispenser Seal Dispenser LC Dispenser UV CURE C F 上基板 TFT 下基板 Assembly Process ODF制成 Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd.        

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