MOCVD设备结构及维护答题.pptVIP

S2位4通换向阀 N2 purifier H2 purifier Hygrometer Gas dosing unit for hydride source Gas dosing unit for MO source MO bubbler Gas supply for hydride sources Gas supply for run lines Hydride run line Hydride vent line Gas supply for auxiliary gas pipes Purging - reactor sight glass MO1 run line MO1 vent line MO run bypass MO2 run line MO2 vent line Gas supply for venting Gas supply for MO2 sources Gas supply for MO1 sources MO vacuum (for changing the MO bubbler NH3 purifier Reactor purges Hydride source SiH4 eg: Growth n(-)GaN Si=12 Source to 80 Dilute to 320 Inject to 60 MO source * MOCVD设备结构