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TiO2纳米颗粒的制备、光催化性能及羟基自由基研究 标题应恰当简明地反映论文内容，精确点明本文的独创性内容小二号 摘 要：应包括目的、方法、结果结论；缩写词第一次出现时请用全称；不要出现公式、图表和参考文献序号。针对金属层间介质以及MEMS等对氧化硅薄膜的需求，采用等离子增强型化学气相淀积(PECVD)技术，以SiH4和N2O为反应气体，低温制备了SiO2薄膜。利用椭偏仪、应力测试系统对SiO2薄膜的厚度、折射率、均匀性以及应力等性能指标进行了测试，探讨了射频功率、反应腔室压力、气体流量比等关键工艺参数对SiO2薄膜性能的影响。结果表明：SiO2薄膜的折射率主要由N2O/SiH4的流量比决定，而薄膜均匀性主要受电极间距以及反应腔室压力的影响。通过优化工艺参数，低温260 ℃下制备了折射率为1.45~1.52中文环境下，用波浪线表示数字范围，均匀性为±0.64%，应力在 ?350 ~ ?16 MPa量、单位和符号严格执行国家标准，不可使用非法定计量单位可控的SiO2薄膜。采用该方法制备的SiO2薄膜均匀性好，结构致密，沉积速率快，沉积温度低，且应力可控，可广泛应用于集成电路以及MEMS器件中。 关键词：二氧化钛纳米颗粒；羟基自由基；光催化活性关键词应能够反映论文的主题内容, 应精确、包含热点信息；注意避免与正文标题重复太多, 以增大论文通过不同角度被检索到的可能性；以3~8个为宜，用分号分隔 中图分类号：可列出一个或中图分类号，按《中国图书馆分类法》确定文献标志码：A文章编号：1672-6030(2015)00-0000-00 Preparation, Photocatalytic Properties and Photogenerated Hydroxyl Radicals of TiO2 Nanoparticles给出英文标题, 内容应与中文对应, 语序可根据中英文逻辑习惯方面的不同进行相应的调整 Abstract: 英文摘要应与中文摘要意思对照To meet the demand of inter-metal dielectric (IMD) 缩写词第一次出现时请用全称（并将缩写写在全称后面的括号中）layers and micro electro mechanical systems (MEMS), silicon dioxide films deposited by plasma enhanced chemical vapor deposition (PECVD) at low temperature with silane (SiH4) and nitrous oxide (N2O) as precursor gases was reported. The ellipsometer and stress measurement system were used to test the thickness, refractive index, uniformity and the stress of SiO2 film, and the effects of ratio frequency (RF) power, chamber pressure and N2O/SiH4 flow ratio on the properties of SiO2 film were studied. The results showed that the refractive index of SiO2 film was mainly determined by N2O/SiH4 flow ratio and the uniformity of the film was influenced by the distance between electrodes and the chamber pressure. Moreover, by optimizing the process parameters, the SiO2 films were deposited at 260 ℃, with the refractive index measured as 1.45—1.52（英文环境下，数字区间用长划线表示，不用波浪线）, the uniformity of ±0.64%, and the stress was efficiently controlled between ?350 MPa to ?16 MPa. The deposited SiO2 films have good uniformity, compact structure, high deposition rate, low deposition temper