Implementation of subRayleighresolution lithography using an使用一种亚瑞利分辨率光刻技术的实现.pptVIP

/19 Demonstration of Sub-Rayleigh Lithography Using aMulti-Photon Absorber Heedeuk Shin, Hye Jeong Chang*, Malcolm N. OSullivan-Hale, Sean Bentley# , and Robert W. Boyd The Institute of Optics, University of Rochester, Rochester, NY 14627, USA * The Korean Intellectual Property Office, DaeJeon 302-791, Korea # Department of Physics, Adelphi University, Garden City, NY Outline Motivation Quantum lithography Proof-of-principle experiments Multi-photon lithographic recording material Experimental results Non-sinusoidal 2-D patterns Conclusion future work Motivation In optical lithography, the