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Height Fluctuations and Intermittency of $V_2 O_5$ Films by Atomic Force Microscopy
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Height Fluctuations and Intermittency of V2O5 Films by Atomic Force Microscopy
A. Iraji zad a, G. Kavei b, M. Reza Rahimi Tabar a,c,d,
and S.M. Vaez Allaei e
a Dept. of Physics, Sharif University of Technology, P.O.Box 11365-9161, Tehran, Iran
b Material and Energy, Research Center, P. O. Box 14155-4777, Tehran, Iran
c CNRS UMR 6529, Observatoire de la Co?te d’Azur, BP 4229, 06304 Nice Cedex 4, France
d Dept. of Physics, Iran University of Science and Technology, Narmak, Tehran 16844, Iran
e Institute for Advanced Studies in Basic Sciences, P. O. Box 45195-159, Zanjan , Iran
The spatial scaling law and intermittency of the V2O5 surface roughness by atomic force microscopy
has been investigated. The intermittency of the height fluctuations has been checked by two different
methods, first, by measuring scaling exponent of q-th moment of height-difference fluctuations i.e.
Cq = |h(x1)? h(x2)|
q and the second, by defining generating function Z(q, N) and generalized
multi-fractal dimension Dq . These methods predict that there is no intermittency in the height
fluctuations. The observed roughness and dynamical exponents can be explained by the numerical
simulation on the basis of forced Kuramoto-Sivashinsky equation.
PACS: 52.75.Rx, 68.35.Ct.
I. INTRODUCTION
Due to the technical importance and fundamental in-
terest, a great deal of effort has been devoted to under-
standing the mechanism of thin-film growth and the ki-
netic roughening of growing surfaces in various growth
techniques. Analytical and numerical treatments of sim-
ple growth models suggest, quite generally, the height
fluctuations have a self-similar character and their aver-
age correlations exhibit a dynamic scaling form [1-6].
Vanadium pentoxide, V2O5, has been the subject of
intense work because of its diverse applications in cat-
alytic oxidation reactions, cathodic electrode in solid
state
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