!!Large-area submicron replica molding of porous low-k dielectric films and application to photonic.pdf
- 1、本文档共6页,可阅读全部内容。
- 2、原创力文档(book118)网站文档一经付费(服务费),不意味着购买了该文档的版权,仅供个人/单位学习、研究之用,不得用于商业用途,未经授权,严禁复制、发行、汇编、翻译或者网络传播等,侵权必究。
- 3、本站所有内容均由合作方或网友上传,本站不对文档的完整性、权威性及其观点立场正确性做任何保证或承诺!文档内容仅供研究参考,付费前请自行鉴别。如您付费,意味着您自己接受本站规则且自行承担风险,本站不退款、不进行额外附加服务;查看《如何避免下载的几个坑》。如果您已付费下载过本站文档,您可以点击 这里二次下载。
- 4、如文档侵犯商业秘密、侵犯著作权、侵犯人身权等,请点击“版权申诉”(推荐),也可以打举报电话:400-050-0827(电话支持时间:9:00-18:30)。
查看更多
!!Large-area submicron replica molding of porous low-k dielectric films and application to photonic
/locate/mee
Microelectronic Engineering 84 (2007) 603–608Large-area submicron replica molding of porous low-k dielectric
films and application to photonic crystal biosensor fabrication
Ian D. Block, Leo L. Chan, Brian T. Cunningham *
Nano Sensors Group, University of Illinois at Urbana-Champaign, 208 N. Wright St, Urbana, IL 61801, USA
Received 13 February 2006; received in revised form 14 December 2006; accepted 14 December 2006
Available online 16 January 2007Abstract
We demonstrate a replica-molding method for submicron patterning of a low-index sol–gel nanoporous glass for the purpose of fab-
ricating large-area (80 cm2) label-free photonic crystal optical biosensors. Scanning electron micrographs show the sol–gel exhibited
minimal shrinkage and good substrate adhesion and depict precise and uniform pattern transfer over the fabricated area within the limits
of measurement resolution. A unique characterization approach is described in which the photonic crystal optical resonance is used to
accurately and quickly characterize the geometrical and material property uniformity over a large area. Uniformity within 1% was mea-
sured over an 80 cm2 area. We suggest that this robust method is an excellent approach for photonic crystal sensor fabrication, and may
also find applications in integrated optics and electronics.
2006 Elsevier B.V. All rights reserved.
Keywords: Low-k; Replica molding; Optical biosensor; Sol–gel glass1. Introduction
Imprint lithography and nanoreplication methods are
emerging as important techniques for imparting submicron
features to a wide array of devices. In comparison to pho-
tolithography, and to a greater extent e-beam lithography,
these methods provide higher throughput, lower cost,
decreased processing complexity and equipment require-
ments, and the ability to directly pattern a large variety
of materials [1]. This approach has previously been used
to successfully mold sol–gel glass precursors into diffractive
optical elements, len
您可能关注的文档
- (Annals of the Brazilian Academy of Sciences).pdf
- !!Chapter 1 Introduction to management and organizaitions.pdf
- (07 TMC) Bandwidth sharing schemes for multimedia traffic in the IEEE 802.11e contention-based WLANs.pdf
- (2007-Scarpellini)High dosage rifaximin for the treatment of small intestinal bacterial overgrowth.pdf
- (NH4)0.5V2O5 nanobelt.pdf
- (PCF中文)2007119163812.pdf
- (psychology, self-help) Bipolar Disorder - Stories of Coping and Courage.pdf
- (AUO)DMO_G085VW01_V0_preliminary_spec_Aug2009.pdf
- (Workshop Chairs) ECDL WS Generalized Documents 2001 Applications of Information Hiding and.pdf
- (全国社会保障基金理事会转持三户).pdf
最近下载
- 委托指导股票买卖协议书范本5篇.docx
- 2024年营养指导员技能竞赛理论知识考试题库500题(含答案).docx
- 酒店消防安全管理制度11.doc VIP
- 程家惠《洋话汉音》(升级版).doc
- 青岛版科学五年级上册第一单元《光》大单元教学设计.docx
- 第4课《古代诗歌四首——天净沙.秋思》说课课件 2024—2025学年统编版语文七年级上册.pptx VIP
- 保健刮痧师保健刮痧师(高级)考点巩固.pdf VIP
- 04大医传承二(1-32讲).doc
- Unit4NaturalDisasters词汇讲解课件高中英语人教版.pptx
- 保健刮痧师《保健刮痧师》高级题库考点(模拟卷).doc VIP
文档评论(0)