Pulsed Supermagnetron Plasma CVD of a-CNxH Electron-Transport Films for Aua-CNxHp-Si Photovoltaic Cells 外文参考文献.docVIP

Journal of Modern Physics, 2011, 2, 398-403 doi:10.4236/jmp.2011.25049 Published Online May 2011 (http://www.SciRP.org/journal/jmp) Pulsed Supermagnetron Plasma CVD of a-CNx:H Electron-Transport Films for Au/a-CNx:H/p-Si Photovoltaic Cells Haruhisa Kinoshita, Hiroyuki Suzuki Research Institute of Electronics, Shizuoka University, Shizuoka, Japan E-mail: rdhkino@ipc.shizuoka.ac.jp Received February 28, 2011; revised April 16, 2011; accepted April 27, 2011 Abstract Hydrogenated amorphous carbon nitride (a-CNx:H) films were formed on p-Si wafers set on a lower elec- trode by pulsed supermagn