软刻蚀技术及其应用.pdfVIP

6 VACUUM 2003 11 11 软刻蚀技术及其应用 陈长琦, 王 艳, 王旭迪, 汪 力 (, 230009) : , , 5 nm100m,, , : ;/ ;; ; : TN305.7 :A :2003) Soft lithography technology and applications CHEN Changqi, WANG an, WANG Xudi, WANG Li ( M achi nery A nd A utomoble College, H ef ei Un iv ers ity of Tech nol ogy , H eif ei 230009, Ch ina) Abstract:Soft lithography represents a patterns replicable strategy based on an elastic stamp/ mold with surface patterned relief structures for transferring patterns. As a nonphotolithographic technique for carrying out nano and microfabrication, soft lithogra phy can generate patterns and structures with feature sizes ranging from 5 nm to 100m. It overcomes difficulties that the traditional photolithography encounters and provides a convenient, effective, lowcost method for theformation and manufacturing of micro and nanostructures on planar or nonplanar substrates. We discuss the principles of three primary techniques ( microcontact printing (CP) , nearfield photolithography(NFP) , nanoimprinting lithography ( NIL) ) , their procedures and problems they face, and in troduce their applications in micro and nanofabrication, microelectronics, materials science, optics, MEMS, and surface chemistry. Key words:soft lithography;elasticmold/ stamp;microcontact printing; near field photolithography;nanoimprint lithography 100 nm , , , ( EUV extreme ultra 1 violet) X [ 1] , , , / , (,, Whitesides ) 3 MPa , , 500 nm , ,, , [ 2, 3] ,