ArF准分子激光光刻的研究现状.pdfVIP

23 5 Vol. 23, No. 5 1999 10 LASER T ECHNOLOGY Octo er, 1999 ArF 宋登元 ( , , 071002) : 193nm ArF 21 ( VLSI) , 193nm : VLSI Research status of deep ultraviolet lithography with 193nm excimer- laser Song D engy uan ( College of Electronics Engineering, He ei University, Baoding, 071002) Abstract: The optical lithography using the 193nm excimer-laser is a key technique for decreasing feature size of very large scale integration( VLSI) at the eginning of the next century and has ecome one of t he challenge topics in the high-tech research areas.T he optical system design, optics materials, excimer- laser source, resists for 193nm and its application in fa rication of CMOS devices are descri ed in t his paper. Key words: lithography excimer laser VLSI ( VLSI) 1958 , , 4 , 40 , VLSI 256M it ( DRAM) 025m2004 , 4G it DRAM , VLSI 013m[ 1,2] VLSI , , , , , VLSI , : R = k 1 / NA , R , , NA , k 1 , NA , NA ( DOF) , : DOF = k2 / ( NA) 2 , k 2 , NA DOF 08m , , DOF , 289 23 5 ArF VLSI , 193nm ArF , 012m[3] , 4G it DRAM , , , 193nm ArF 1 , , 193nm ArF [ 4] , 1 , , ( margin mirror) , 1 193nm , , , , , , , , ArF , , , , 248nm KrF 0003nm[ 5] , , , , 14% , NA 06, 016m , 06m 2 193nm : , ,