Stepper简介.ppt

Stepper 機台結構原理簡介及注意事項 IC3 / PMA3 / PHOTO 黃郁斌 9/2/1999 * Index 1 1:Photo 區簡介 2.FAB 流程 3.Stepper 機台種類 4.機台外觀 5.操作方法 6.照明光源 7.對準系統 8.Focus Leveling 系統 9.曝光程序 10.曝光參數 Index2 11.Auto feedback 系統 12.機台 Alarm 13.Stepper 特殊 Function (Extended,Deep…) 14.DUV Stepper 15.晶邊曝光 16.日常測機 17.操作注意事項 1.PHOTO 簡介 STEPPER 顯影機 光阻機 SEM CD AA C D 量 測 A A 量 測 曝光圖形 ADI SIN, POLY, ILD, METAL POLY CONT METAL SIN, POLY CONT,METAL P+,N+ P-WELL P+ P-WELL PLDD N+ 2.FAB 流程 L7W01 SIN P-WELL P-FIELD POLY PLDD P+ N+ CONT METAL1 MVIA1 METAL2 MVIA2 METAL3 PAD 3.Stepper機台種類 DUV: 0.25um 以上可生產機台 EX14C: E11-2, E11-3, E11-4, E12-1 EX12B: E8-7 I-line(5x): 0.35um 以上可生產機台 I14: I11-1, I7-7 I12: F9-4, F9-5, F9-6 I11: I7-1 ~ I7-6, I8-1 ~ I8-6 I-line(2.5x): 簡單層機台 4425i: O9-1 ~ O9-3, O-R1 ~ O-R3 6.照明光源 光源波長 I-line: 365 nm 的 Hg Lamp DUV(KrF): 波長 246nm 的 Laser DUV(ArF): 波長 193nm 的 Laser R= K*波長/NA Illumination ID DUV: ID1 -NA 0.6 Conv. (一般) ID4 -NA 0.6 Annular (Poly) I-line: ID7 -NA 0.57 Conv. (一般) ID10 -NA 0.5 Conv. (DRAM Metal) 7.對準系統-1 間接對準 光罩對準: 光罩 = Stepper 對準 Baseline check: Wafer Alignemt Sensor = 光罩 晶片對準: Search, EGA Wafer Alignment Sensor LSA: Laser Step Alignment (光繞射) FIA: Field Image Alignment ( 影像處理) 7.對準系統-2 8.Focus Leveling 系統- I11型 Height detecting ? By focus sensor (light source???White light) Field tilt detecting ? By leveling sensor (light source???Single wavelength) Leveling light source Focus detector Leveling detector Focus light source i12,EX12: drive point i11 and previous: fixed point 8.Focus Leveling 系統- I14型 2-dimensional multi-point focus sensors are used (Applicable for both Focusing Leveling, Light source···White light) Light source Position Detector I11型 Inline multi-point focus sensors I14型 7?7 , 2-dimensional multi-point focus sensors, Max. 9 points can be selected from total 49 points (Tracking sensors are auxiliary combined.) *Tracking sensors: Check whether the height of the wafer surface is within the measure