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RZ 3242 (# 93288) 12/06/00 Physical Sciences 15 pages Research Rep ort Conformal Contact and Pattern Stability of Stamps Used for Soft Lithography Alexander Bietsch and Bruno Michel IBM Research Zurich Research Lab oratory 8803 Rusc hlikon Switzerland LIMITED DISTRIBUTION NOTICE This rep o rt has b een submitted for publication outside of IBM and will probably b e copyrighted if accepted fo r publication. It has b een issued as a Research Rep ort for early dissemination