世界半导体生产机台安全设计验收标准.doc

精品汇编资料 Global Semiconductor Safety Services, LLC SEMI S2-93A Product Safety Assessment Final Report 世界半导体生产机台安全设计验收标准 Applied Materials Chemical Mechanical Polishing System Model: Mirra Trak CMP工艺应用材料 June 19, 1998 Prepared for: Applied Materials 3111 Coronado Drive Santa Clara, CA 95054 Prepared by: Global Semiconductor Safety Services, LLC 1313 Geneva Drive Sunnyvale, CA 94089 GS3 Job No. 980029 GS3 Document No. 980029F2  Client - Confidential 保密合约 The information used to prepare this report was based on interviews with Applied Materials’ engineers. The information was also based on inspections of the Chemical Mechanical Polishing System, Model: Mirra Trak. This information was gathered over the period between February 2, 1998 and February 4, 1998, and during a re-inspection of the system on June 3, 1998. A preliminary assessment of the system was also performed on September 25, 1996 through September 26, 1996 and the results of this evaluation were also used. All observations and recommendations are based on conditions and descriptions of the Chemical Mechanical Polishing System, Model: Mirra Trak, during the time of data collection and upon information made available to Global Semiconductor Safety Services. This reports significance is subject to the adequacy and representative characteristics of the Chemical Mechanical Polishing System, Model: Mirra Trak, and to the comprehensiveness of the tests, examinations and/or surveys made. Reference to Global Semiconductor Safety Services, including reproduction of Global Semiconductor Safety Services’ service mark, in promotional materials, is permitted only with Global Semiconductor Safety Services’ express written consent. The service performed has been conducted in accordance with the standards currently accepted in our profession, and at the high level of skill and care exercised by Global Semiconductor Safety Services’ staff. Lastly, this re