表面覆盖退火对ZnO薄膜光学性质的影响 Effect of Surface-Covered Annealing on the Optical Properties of ZnO Films Grown by MOCVD.pdfVIP
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第27卷第3期 半导体学报 V01.27No.3
2006年3月 CHINESEJOURNALoFSEMICONDUCTORS Mar,2006
EffectofSurface—Coveredonthe
AnnealingOptical
ofZnOFilmsGrownMOCVD
Properties by
Li,Pu
Wang Yong,FangWenqing,MoChunlan,XiongChuanbing,andJiangFengyi+
ResearchCenterLuminescentMaterialsandDevicestheEducation
(Engineering for of Ministry
330047.China)
NanchangUniversity,Nanchang
films metal chemical at areannealedat
Abstract:ZnO
grownby organic vapordepositionatmosphericpressure
850℃.withthefilmsurfaces toairorcovereda wafer.The ofthe
exposed by sapphire opticalpropertiesas-grown
andtheannealed arestudied isfoundthatthe
samples byphotoluminescence(PL)spectroscopy.Itair·exposure
removesthe fromtheZnOfilmsbut increasesthe e-
effectively hydrogenimpurities greatly deep-level
annealing
mission.Inthesurface·coveredannealed eliminationofthe isalsoobserved,and
sample,an hydrogenimpurities
the emission Thefreeexcitonemissionis enhancedintheZnOfilm
deep-leveldisappearscompletely significantly
aftersurface-covered
annealing.
words:zincoxide
Key annealing;opticalproperties;exciton
PAOC:8140T
CLCnumber:TN304Doanllent Article
code:A liD:0253—4177(2006)03.0409—04
cal andthe of lumines·
increase
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